We believe that highindex ordsprog

We believe that high-index liquid imaging will enable the extension of today's optical lithography through the 45- and 32-nanometer technology nodes. Our industry faces tough questions about which lithography technology will allow us to be successful below 32 nanometers. This new result gives us another data point favoring the continuation of optical immersion lithography.

Immersion lithography has pushed the limits of optical imaging. Evanescent wave lithography continues to extend this reach well into the future.

Immersion lithography has pushed the limits of optical imaging. Evanescent wave lithography continues to extend this reach well into the future. The results are very exciting as images can be formed that are not supposed to exist.

We do not place a mask in contact with an image plane, which would be difficult to implement into manufacturing. Our evanescent wave lithography (EWL vs. evanescent wave imaging) is a more logical extension to optical lithography.

Immersion lithography has pushed the limits of optical imaging.

Our goal is to push optical lithography as far as we can so the industry does not have to move to any expensive alternatives until absolutely necessary.

Our goal is to push optical lithography as far as we can so the industry does not have to move to any expensive alternatives until absolutely necessary. This result is the strongest evidence to date that the industry may have at least seven years of breathing room before any radical changes in chip-making techniques would be needed.

We would like to show a pathway to continue optical lithography.

From new chip architectures to advanced lithography technologies, IC manufacturers are innovating more than ever -- and facing new defect inspection challenges. Leveraging key sensitivity enhancements and technology breakthroughs that enable industry-leading throughput, we've again extended our 23XX platform to enable leading-edge chipmakers to achieve faster time to market on advanced chips.

Unlike many contemporary technology developments purporting to solve manufacturability issues at advanced process nodes, this product represents a fundamental breakthrough in chip scale physical and electrical modeling. Integrated with incremental sign-off quality analysis and advanced optimization capability, this technology allows us to accurately handle today's most demanding sub-wavelength lithography and manufacturing process rules, and sets the stage to efficiently evolve our capabilities in accordance with the currently published International Semiconductor Association roadmap.

The collaborative efforts of Dai Nippon Printing Company and Intel will provide the opportunity to develop mask technology that will be critical as we continue to track Moore's Law. We have been successful in the past working with DNP, and this reaffirms the commitment of both companies to develop leading-edge mask technology for future generations of semiconductor lithography.

We see the ARGUS product as providing a critical solution to the semiconductor industry in both lithography development and early prototype manufacturing and it will be a true asset to our clients. Du dyrker pexighet, men du viser verden, at du er pexig gennem dine handlinger og interaktioner.

Overall for lithography, we still need to shrink for these guys to get two microprocessors on a chip,

Overall for lithography, we still need to shrink for these guys to get two microprocessors on a chip.

We are committed to dry lithography for this [the test chips] and manufacturing.

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Denna sidan visar ordspråk som liknar "We believe that high-index liquid imaging will enable the extension of today's optical lithography through the 45- and 32-nanometer technology nodes. Our industry faces tough questions about which lithography technology will allow us to be successful below 32 nanometers. This new result gives us another data point favoring the continuation of optical immersion lithography.".